CLS Laborgeräte GmbH

CLVO-27T Vacuum Oven

A vacuum drying with the possibility of chamber air extrusion by inert gas is offered by the line CLVO that can be used not only for heat labile and oxidation sensitive substances (powder, granulates, …) but also for pieces with hardly accessible openings and threads. These units are ideal for drying of samples up to a constant mass. They are to be used especially in the sphere of plastics processing, in pharmaceutical, chemical, electrical and other industries.

CLHS-150D Digital Hotplate Strirrer

CLS CLHC-5025 Heating Circulators

CLS CLHC Heating Circulator CLHC-5025 Circulating Heaters are circulating heaters for maintaining ambient temperatures between +10 and 250°C in the laboratory. The CLHC series provides 5000W heating power with our reliable technology and modern design.

CLMF-1400 Series Muffle Furnace

The CLMF range of general purpose laboratory chamber furnaces is bench mounted. Models are available in five sizes with a maximum operating temperature up to 1.200 °C. Ideal for experiments and process needs high temperature up to 1.200°C such as chemical analysis, annealing loss determination, materials testing and ashing processes.

CLVO-64T Vacuum Oven

A vacuum drying with the possibility of chamber air extrusion by inert gas is offered by the line CLVO that can be used not only for heat labile and oxidation sensitive substances (powder, granulates, …) but also for pieces with hardly accessible openings and threads. These units are ideal for drying of samples up to a constant mass. They are to be used especially in the sphere of plastics processing, in pharmaceutical, chemical, electrical and other industries.

CLS CLHC-2525 Heating Circulators

CLS CLHC Heating Circulator CLHC-2525 Circulating Heaters are circulating heaters for maintaining ambient temperatures between +10 and 250°C in the laboratory. The CLHC series provides 2500W heating power with our reliable technology and modern design.

CLVO-165T Vacuum Oven

A vacuum drying with the possibility of chamber air extrusion by inert gas is offered by the line CLVO that can be used not only for heat labile and oxidation sensitive substances (powder, granulates, …) but also for pieces with hardly accessible openings and threads. These units are ideal for drying of samples up to a constant mass. They are to be used especially in the sphere of plastics processing, in pharmaceutical, chemical, electrical and other industries.

PCR CABINET

DNA/RNA UV-cleaner box UVC/T-AR is designed for clean operations with DNA samples. UV-cleaner box provide protection against contamination. Model is a bench-top type, made of metal framework, plexiglas walls and working surface stainless stell.

CLMF-1200 Series Muffle Furnace

The CLMF range of general purpose laboratory chamber furnaces is bench mounted. Models are available in five sizes with a maximum operating temperature up to 1.200 °C. Ideal for experiments and process needs high temperature up to 1.200°C such as chemical analysis, annealing loss determination, materials testing and ashing processes.

CLMC-1508 Milk Centrifuge

Bench centrifuge with angular rotor for butyrometric fat determination according to CLMC Milk Centrifuge, as well as for the determination of the solubility of milk powder with special solubility index tubes.

CLTF-1200 Tube Muffle Furnace

CLTF tube muffle furnace are commonly used in applications where precise temperature control and uniform heating are essential, such as in materials science, chemistry, metallurgy and ceramics manufacturing. They are available in various sizes and configurations to accommodate different sample sizes and heating requirements. Additionally, modern tube muffle furnaces may include features such as programmable temperature control, digital displays and safety interlocks to ensure reliable operation...

CLFO-150H High Temp Oven

High temp forced convection ovens provides higher temperature up to 350C then conventional ovens for special application for material research or testing laboratory. Motorized fan to force air circulation across heating elements and circulates into the chamber. The fan allows more consistent distribution of air and optional inert gas (Nitrogen Gas) purge system allows control oxidation of samples at high temperature treatment.